constant-current magnetron 恒流磁控管
Direct current reactive magnetron sputtering 磁控溅射法
direct current magnetron co-sputtering 双靶直流共溅射法
direct current magnetron reaction sputtering 直流磁控溅射
Mid-frequency direct current magnetron sputtering 中频直流反应磁控溅射
mid-frequency alternating current magnetron sputtering 中频交流磁控溅射
Magnetron Sputtering Technology has been applied in the field of film preparing widely, however, the quality of the film is influenced by stability of target current badly.
磁控溅射技术在薄膜制备领域的应用十分广泛，而溅射靶电流的稳定性极大的影响溅射镀膜的膜层质量。
Magnetron sputtering process has widely been applied to thin film preparation, during which, the quality of thin film is affected badly by the current stability of target.
磁控溅射技术在薄膜制备领域的应用十分广泛，而溅射靶电流的稳定性极大的影响溅射镀膜的膜层质量。
A novel method to drive magnetron by constant voltage-constant current technique is proposed.
提出了用恒压-恒流技术驱动磁控管的新方法。
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